Gang He , Zhaoqi Sun

High-k Gate Dielectrics for CMOS Technology

Wiley-VCH

Date de publication : 2012-08-10

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological
viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these
materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.

Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections
with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

195,12

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À propos

Éditeur
Collection
n.c
Parution
2012-08-10
Pages
590 pages
EAN papier
9783527330324

Auteur(s) du livre



Caractéristiques détaillées - droits

EAN PDF
9783527646371
Prix
195,12 €
Nombre pages copiables
0
Nombre pages imprimables
590
Taille du fichier
19651 Ko
EAN EPUB
9783527646364
Prix
195,12 €
Nombre pages copiables
0
Nombre pages imprimables
590
Taille du fichier
12370 Ko

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